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US Patent Issued to NGK INSULATORS on Aug. 25 for "Group-III element nitride semiconductor substrate" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,056, issued on Aug. 25, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan). "Group-III element nitride semiconductor substrate" was invent... और पढ़ें


US Patent Issued to SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION on Aug. 25 for "Vacuum packaging manufacturing method and semiconductor devices manufactured thereby" (South Korean Inventor)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,057, issued on Aug. 25, was assigned to SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (Seoul, South Korea). "Vacuum packaging manufacturing met... और पढ़ें


US Patent Issued to Tokyo Electron on Aug. 25 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,058, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... और पढ़ें


US Patent Issued to Applied Materials on Aug. 25 for "Titanium nitride gapfill processes for semiconductor structures" (California Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,059, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Titanium nitride gapfill processes for semiconductor... और पढ़ें


US Patent Issued to Geminatio on Aug. 25 for "Generation of multiline etch substrates" (Colorado Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,060, issued on Aug. 25, was assigned to Geminatio Inc. (N.Y.). "Generation of multiline etch substrates" was invented by Brennan Peterson (... और पढ़ें


US Patent Issued to Applied Materials on Aug. 25 for "Treatments to enhance material structures" (California Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,061, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Treatments to enhance material structures" was inven... और पढ़ें


US Patent Issued to Applied Materials on Aug. 25 for "Methods to improve oxide sidewall quality" (California Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,062, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods to improve oxide sidewall quality" was inven... और पढ़ें


US Patent Issued to Tokyo Electron on Aug. 25 for "Method of forming silicon nitride film and film forming apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,063, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo). "Method of forming silicon nitride film and film forming apparatus" wa... और पढ़ें


US Patent Issued to Tokyo Electron on Aug. 25 for "Manufacturing method for semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,064, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo). "Manufacturing method for semiconductor device" was invented by Kiyota... और पढ़ें


US Patent Issued to KOKUSAI ELECTRIC on Aug. 25 for "Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,065, issued on Aug. 25, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo). "Method of processing substrate, method of manufacturing semiconduc... और पढ़ें